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MBE32

MBE 32 Series
2" / 3" MBE research system. The RIBER MBE 32 system is a highly flexible and efficient 3" single-wafer epi reactor, which provides all the necessary MBE tools and in-situ characterization capabilities to achieve state-of-the-art epitaxy of III-Vs, II-VIs, MCTs, nitrides and silicon alloys. With more than 250 operational systems worldwide, its unequalled reliability, low operating cost and proven track record in the supply of high quality electronic and optoelectronic materials have made it the "tool of choice" for the growth of compound semiconductor materials.

The 8 cell ports are grouped together on the evaporation flange, which also includes a cryogenic panel completely surrounding all the hot parts of the cells, ensuring maximum trapping of all residual species. This flange can be specifically adapted for the growth of mercury compounds or the nitrides of group III elements. The pumping system, which can include several types of pump, is adapted to each particular application.

Introduction of samples is implemented by the use of: (1) loadlock chambers (R&D systems), or (2) modular transfer modules (Modutrac™), enabling the addition of chambers for specific treatments (metallization, pre-treatment, sampling, analysis, outgassing, etc.).

Gas-source MBE and CBE configurations combining the use of solid sources and/or gas sources are also available. refer to the gas distribution system section for more information.

Key features include

Flexible and modular MBE research system
Can be used for III-V, II-VI, HgCdTe or Gan epi
Designed for the highest quality epi growth
Eight MBE source ports
In-situ characterization capability
Ease of use and maintenance
Clean room assembly and testing
Riber worldwide support.

For full specifications, please contact us webrequest@episerve.de