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SIVA 45

4" e-gun evaporation system

The SIVA 45 system has been specially developed for the growth of alloys combining silicon, germanium or carbon with metals. It possesses three electron beam evaporating guns, one of which can be multi-crucible, and can take up to four solid source cells or gas injectors. The beam fluxes produced by the electron guns can be monitored by quartz film devices, by electron emission spectrometers or by a quadrupole, depending on the elements employed.

The system can include a limited number of chambers (growth plus introduction, or growth plus intermediate chamber plus introduction). The 5" version can be connected to all the chambers of the Epineat series with the aid of magnetic modules.

Key features include

State-of-the-art e-beam evaporation system
Ideal for silicon and carbon alloys epi growth.
Accomodates horyzontal substrates up to 4"
Three e-beam gun ports
Four MBE source ports
In-situ characterization capability
Ease of use and maintenance
Clean room assembly and testing
Riber worldwide support.

For full specifications, please contact us webrequest@episerve.de