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Compact 21 
2" / 3" MBE research
system
The Compact 21 system is the new Riber baseline MBE
system. This versatile reactor is a flexible and affordable system with
features carefully designed to meet the highest specifications for the research
of all compound semiconductor materials. Based on Riber's field-proven "Vertical
Reactor" technology, Compact 21 is a 2"/3" integrated system,
providing, within a small footprint, all the necessary MBE facilities and
state-of-the-art characterization capabilities. Furthermore, because of
its ergonomic and modular design, operation and routine maintenance are
both extremely easy. Depending on the application (process and substrate
size) two epitaxy chamber configurations are available: seven source ports
(Compact 21S) or ten source ports (Compact 21T). Eleven source ports available
upon request. Introduction of samples is implemented by the use of: (1)
loadlock chambers (R&D systems), or (2) modular transfer modules (Modutrac™),
enabling the addition of chambers for specific treatments (metallization,
sampling, analysis, outgassing, etc.). 
Gas-source MBE and CBE configurations combining the
use of solid sources and/or gas sources are also available. refer to the
gas distribution system section for more information.
Key features include
Excellent "first" MBE system or R&D chamber
Can be used for III-V, II-VI, HgCdTe or Gan epi.
Accomodates horyzontal substrates up to 3"
Six to eleven MBE source ports
Expandable through upgrades and options
In-situ characterization capability
Ease of use and maintenance
Clean room assembly and testing
Riber worldwide support.
For full specifications, please contact us webrequest@episerve.de
